Fabrication And Characterization Of Photonic Crystal Slow Light Waveguides And Cavities

Overview

This article discusses the fabrication and characterization of photonic crystal slow light waveguides and cavities. The methods include electron beam lithography and plasma etching to create membrane photonic crystal devices.

Key Study Components

Area of Science

• Photonics
• Optical Engineering
• Material Science

Background

• Photonic crystal devices are essential in various applications within the photonics community.
• Understanding fabrication techniques is crucial for advancing these technologies.
• Characterization methods help in evaluating device performance.
• Slow light waveguides and cavities have unique optical properties.

Purpose of Study

• To outline a fabrication technique for photonic crystal devices.
• To present optical characterization methods for evaluating these devices.
• To contribute to the knowledge base in photonics research.

Methods Used

• Preparation of silicon on insulator chip for electron beam lithography.
• Cleaning and spin coating the chip with ZEP five 20 a resist.
• Exposure and development of the photonic crystal pattern using electron beam lithography.
• Plasma etching to transfer the pattern into the silicon layer.

Main Results

• Successful fabrication of membrane photonic crystal devices.
• Demonstration of effective optical characterization methods.
• Insights into the performance of slow light waveguides and cavities.
• Contribution to the advancement of photonic device technology.

Conclusions

• The outlined methods are effective for fabricating photonic crystal devices.
• Characterization techniques provide valuable insights into device performance.
• This research supports further developments in photonics applications.

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